Liquid processing apparatus and process liquid supplying method
US8491726B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 17, 2008 |
| Grant date | Jul 23, 2013 |
| Priority date | — |
| Expiry date | Oct 30, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A liquid processing apparatus includes: a processing part 80 configured to process an object to be processed by a process liquid; a supply path 1 connected to the processing part 80, the supply path 1 being configured to guide the process liquid to the processing part 80; a solvent supply part 7 configured to supply a solvent to the supply path 1; and a chemical-liquid supply part 5 configured to supply a chemical liquid to the supply path 1 through a chemical-liquid supply path so as to generate a chemical liquid diluted with the solvent. A measuring part 10, which is configured to measure a conductivity of the chemical liquid diluted with the solvent, is disposed in the supply path at a position downstream from a connection points 25a, 35a, 45a, to which the chemical-liquid supply path 6 is connected. An additional chemical-liquid supply part 1, which is configured to supply an additional chemical liquid different from the chemical liquid through an additional chemical-liquid supply path 3, is connected to the supply path at a position downstream from a measuring point 10a on which the measuring part 10 is disposed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.