Drive current increase in field effect transistors by asymmetric concentration profile of alloy species of a channel semiconductor alloy
US8501601B2 · kind B2 · utility
6Cited by
2References
15Claims
0Family size
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Key dates
| Filing date | Sep 22, 2011 |
| Grant date | Aug 6, 2013 |
| Priority date | — |
| Expiry date | Sep 22, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/021
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
When forming sophisticated transistors, the channel region may be provided such that the gradient of the band gap energy of the channel material may result in superior charge carrier velocity. For example, a gradient in concentration of germanium, carbon and the like may be implemented along the channel length direction, thereby obtaining higher transistor performance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.