Photoacid generator, chemically amplified resist composition including the same, and associated methods
US8536347B2 · kind B2 · utility
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Key dates
| Filing date | Sep 29, 2008 |
| Grant date | Sep 17, 2013 |
| Priority date | — |
| Expiry date | Apr 3, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A photoacid generator represented by Formula 1 or Formula 2:wherein R1, R2, and R3 are each independently a C1-C10 alkyl group, X is a C3-C20 alicyclic hydrocarbon group forming a ring with S+, and at least one CH2 group in the alicyclic hydrocarbon group may be replaced with at least one selected from the group consisting of S, O, NH, a carbonyl group, and R5—S+A−, where R5 is a C1-C10 alkyl group, and A− is a counter-ion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.