Method of manufacturing a miniaturized device

US8542342B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Markus Schwab · Aalen, DE
• Aksel Goehnermeier · Aalen, DE
• Toralf Gruner · Hennef (Sieg), DE
• Tammo Uitterdijk · De Bilt, NL

Key dates

• Filing date: Mar 20, 2009
• Grant date: Sep 24, 2013
• Expiry date: Dec 30, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70258
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.