Methods of forming conductive contacts
US8580666B2 · kind B2 · utility
4Cited by
20References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2011 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Sep 27, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods for forming memory devices and integrated circuitry, for example, DRAM (dynamic random access memory) circuitry, structures and devices resulting from such methods, and systems that incorporate the devices are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.