Patent · US Active

Bonding of substrates including metal-dielectric patterns with metal raised above dielectric and structures so formed

US8617689B2 · kind B2 · utility

8Cited by
4References
9Claims
0Family size

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Key dates

Filing dateApr 10, 2012
Grant dateDec 31, 2013
Priority date
Expiry dateApr 10, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31678
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Bonding of substrates including metal-dielectric patterns on a surface with the metal raised above the dielectric, as well as related structures, are disclosed. One method includes providing a first substrate having a metal-dielectric pattern on a surface thereof; providing a second substrate having a metal-dielectric pattern on a surface thereof; performing a process resulting in the metal being raised above the dielectric; cleaning the metal; and bonding the first substrate to the second substrate. A related structure is also disclosed. The bonding of raised metal provides a strong bonding medium, and good electrical and thermal connections enabling creation of three dimensional integrated structures with enhanced functionality.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.