Patent · US Active

Process for MEMS scanning mirror with mass remove from mirror backside

US8636911B2 · kind B2 · utility

0Cited by
23References
19Claims
0Family size

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Key dates

Filing dateOct 7, 2010
Grant dateJan 28, 2014
Priority date
Expiry dateMay 7, 2032

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81B2201/042
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Two methods of fabricating a MEMS scanning mirror having a tunable resonance frequency are described. The resonance frequency of the mirror is set to a particular value by mass removal from the backside of the mirror during fabrication.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.