Method and apparatus for masking solar cell substrates for deposition
US8677929B2 · kind B2 · utility
3Cited by
65References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2011 |
| Grant date | Mar 25, 2014 |
| Priority date | — |
| Expiry date | Dec 30, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed are methods and apparatus for masking of substrates for deposition, and subsequent lifting of the mask with deposited material. Masking materials are utilized that can be used in high temperatures and vacuum environment. The masking material has minimal outgassing once inside a vacuum chamber and withstand the temperatures during deposition process. The mask is inkjeted over the wafers and, after deposition, removed using agitation, such as ultrasonic agitation, or using laser burn off.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.