Chuck for supporting and retaining a test substrate and a calibration substrate

US8680879B2 · kind B2 · utility

Assignee

• Cascade Microtech, Inc. · US

Inventors

• Andrej Rumiantsev · Dresden, DE
• Stojan Kanev · Sacka, DE
• Steffen Schott · Schwieberdingen, DE
• Karsten Stoll · Wilthen, DE

Key dates

• Filing date: Aug 12, 2011
• Grant date: Mar 25, 2014
• Expiry date: Jun 22, 2032

Classification

• Technology area (CPC G): Physics
• CPC primary: G01R31/2886
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A chuck for supporting and retaining a test substrate includes a device for supporting and retaining a calibration substrate. The chuck comprises a first support surface for supporting a test substrate and a second support surface, which is laterally offset to the first support surface, for supporting a calibration substrate. The calibration substrate has planar calibration standards for calibration of a measuring unit of a prober, and dielectric material or air situated below the calibration substrate at least in the area of the calibration standard. In order to be able to take the actual thermal conditions on the test substrate and in particular also on known and unknown calibration standards and thus the thermal influence on the electrical behavior of the calibration standard used into consideration, the second support surface is equipped for temperature control of the calibration substrate.