Diffusion barrier layer for resistive random access memory cells

US8686389B1 · kind B1 · utility

Assignee

• INTERMOLECULAR, INC. · US

Inventors

• Yun Wang · San Jose, US
• Imran Hashim · Saratoga, US

Key dates

• Filing date: Oct 16, 2012
• Grant date: Apr 1, 2014
• Expiry date: Oct 16, 2032

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10B63/84

Abstract

Provided are resistive random access memory (ReRAM) cells having diffusion barrier layers formed from various materials, such as beryllium oxide or titanium silicon nitrides. Resistive switching layers used in ReRAM cells often need to have at least one inert interface such that substantially no materials pass through this interface. The other (reactive) interface may be used to introduce and remove defects from the resistive switching layers causing the switching. While some electrode materials, such as platinum and doped polysilicon, may form inert interfaces, these materials are often difficult to integrate. To expand electrode material options, a diffusion barrier layer is disposed between an electrode and a resistive switching layer and forms the inert interface with the resistive switching layer. In some embodiments, tantalum nitride and titanium nitride may be used for electrodes separated by such diffusion barrier layers.