Patent · US Active

Methods and apparatus for calibrating flow controllers in substrate processing systems

US8707754B2 · kind B2 · utility

8Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 29, 2010
Grant dateApr 29, 2014
Priority date
Expiry dateJun 30, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/877
  • WIPO fieldMechanical elements
  • WIPO sectorMechanical engineering

Abstract

Methods and apparatus for calibrating a plurality of gas flows in a substrate processing system are provided herein. In some embodiments, a substrate processing system may include a cluster tool comprising a first process chamber and a second process chamber coupled to a central vacuum transfer chamber; a first flow controller to provide a process gas to the first process chamber; a second flow controller to provide the process gas to the second process chamber; a mass flow verifier to verify a flow rate from each of the first and second flow controllers; a first conduit to selectively couple the first flow controller to the mass flow verifier; and a second conduit to selectively couple the second flow controller to the mass flow verifier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.