Methods for processing substrates in process systems having shared resources
US8721798B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 2010 |
| Grant date | May 13, 2014 |
| Priority date | — |
| Expiry date | May 5, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32899
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for processing substrates in twin chamber processing systems having first and second process chambers and shared processing resources are provided herein. In some embodiments, a method may include providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber; providing one or more processing resources from the shared processing resources to only the first processing volume of the first process chamber; and performing a process on the substrate in the first process chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.