Patent · US Active

Method and apparatus for modifying a substrate surface of a photolithographic mask

US8735030B2 · kind B2 · utility

0Cited by

34References

12Claims

0Family size

Assignees

Carl Zeiss SMT GmbH · DE
Carl Zeiss SMS Ltd. · IL

Inventors

Sergey Oshemkov · Le Blanc-Mesnil, FR
Ralph Klaesges · Aalen, DE
Markus Mengel · Heidenheim, DE

Key dates

Filing date	Apr 12, 2011
Grant date	May 27, 2014
Priority date	—
Expiry date	Aug 5, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70783
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Disclosed is a method of modifying of a surface of a substrate of a photolithographic mask for extreme ultraviolet radiation comprising the step of focusing femtosecond light pulses of a laser system onto the substrate so that a plurality of color centers is generated inside the substrate, wherein the color centers are distributed to cause a modification of the substrate surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.