Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography

US8746975B2 · kind B2 · utility

Assignee

• MEDIA LARIO S.R.L. · IT

Inventors

• Giovanni Bianucci · Vimercate, IT
• Fabio Zocchi · Samarate, IT
• Robert Banham · Stowmarket, GB
• Marco Pedrali · Bergamo, IT
• Boris Grek · Hayward, US
• Natale M. Ceglio · Pleasanton, US
• Dean M. Shough · Newark, US
• Gordon Yue · Sunnyvale, US
• Daniel Stearns · Mountain View, US
• Richard Levesque · Livermore, US
• Giuseppe Valsecchi · Oggiono, IT

Key dates

• Filing date: Jan 23, 2012
• Grant date: Jun 10, 2014
• Expiry date: Aug 28, 2032

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70891
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.