Target for extreme ultraviolet light source

US8791440B1 · kind B1 · utility

Assignee

• ASML NETHERLANDS B.V. · NL

Inventors

• Yezheng Tao · San Diego, US
• Robert Jay Rafac · Encinitas, US
• Igor V. Fomenkov · San Diego, US
• Daniel John William Brown · Woodbury, US
• Daniel J. Golich · San Diego, US

Key dates

• Filing date: Mar 14, 2013
• Grant date: Jul 29, 2014
• Expiry date: Mar 14, 2033

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01S3/10
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.