Patent · US Active

Gas transport delay resolution for short etch recipes

US8794267B2 · kind B2 · utility

12Cited by
18References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 17, 2008
Grant dateAug 5, 2014
Priority date
Expiry dateDec 12, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/87885
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.