Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus
US8830472B2 · kind B2 · utility
8Cited by
13References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 30, 2009 |
| Grant date | Sep 9, 2014 |
| Priority date | — |
| Expiry date | Oct 20, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8845
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.