Shared gas panels in plasma processing systems
US8851113B2 · kind B2 · utility
8Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 2012 |
| Grant date | Oct 7, 2014 |
| Priority date | — |
| Expiry date | Jan 26, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87885
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Methods and apparatus for shared gas panel for supplying a process gas to a plurality of process modules are disclosed. The shared gas panel includes a plurality of mixing valves and at least two mixing manifolds for a given mixing valve to service at least two process modules. The mixing manifolds are disposed on a given plane and staggered to save space. Components of the shared gas panel are also stacked vertically in order to reduce volume of the shared gas panel enclosure. Components are optimized such that the two mixing manifolds coupled to the given mixing valve receive equal mass flow to eliminate matching issues.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.