Method of making vertical transistor with graded field plate dielectric
US8853029B2 · kind B2 · utility
4Cited by
6References
7Claims
0Family size
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Key dates
| Filing date | Jul 21, 2011 |
| Grant date | Oct 7, 2014 |
| Priority date | — |
| Expiry date | Sep 20, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/516
Abstract
An electronic device has a plurality of trenches formed in a semiconductor layer. A vertical drift region is located between and adjacent the trenches. An electrode is located within each trench, the electrode having a gate electrode section and a field plate section. A graded field plate dielectric having increased thickness at greater depth is located between the field plate section and the vertical drift region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.