Patent · US Active

Microlithographic projection exposure apparatus

US8854604B2 · kind B2 · utility

4Cited by

3References

22Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Deguenther · Aalen, DE
Michael Patra · Oberkochen, DE
Andras G. Major · Oberkochen, DE

Key dates

Filing date	Aug 23, 2011
Grant date	Oct 7, 2014
Priority date	—
Expiry date	Apr 19, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG02B26/0833
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.