Flexible scatterometry metrology system and method
US8908175B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2006 |
| Grant date | Dec 9, 2014 |
| Priority date | — |
| Expiry date | Jun 8, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/211
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A scatterometry tool including an illumination source for directing a light beam into a first optical beam shaping and positioning element at an illumination pupil plane of the tool where the light beam is modulated and directed to an objective lens system having a high numerical aperture. The objective receiving the modulated light beam and directing it onto a target to generate a scattering signal. The objective lens collects the scattering signal and directs it to a second optical beam shaping and positioning element at a collection pupil plane where the signal is modulated and then directed to detectors for receiving and processing the signal to determine surface characteristics of the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.