Cut mask aware contact enclosure rule for grating and cut patterning solution
US8918746B1 · kind B1 · utility
13Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2013 |
| Grant date | Dec 23, 2014 |
| Priority date | — |
| Expiry date | Sep 4, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D89/10
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Methodologies and an apparatus enabling a selection of design rules to improve a density of features of an IC design are disclosed. Embodiments include: determining a feature overlapping a grating pattern of an IC design, the grating pattern including a plurality of grating structures; determining a shape of a cut pattern overlapping the grating pattern; and selecting one of a plurality of rules for the feature based on the determined shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.