Method and apparatus for determining factors for design consideration in yield analysis
US8924904B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 2008 |
| Grant date | Dec 30, 2014 |
| Priority date | — |
| Expiry date | Apr 4, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/08
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention provide methods and apparatuses for determining factors for design consideration in yield analysis of semiconductor fabrication. In one embodiment, a computer-implemented method for determining factors for design consideration in yield analysis of semiconductor fabrication includes obtaining a geometric characteristic of a defect on a chip and obtaining design data of the chip, where the design data is associated with the defect. The method further includes determining a criticality factor of the defect based on the geometric characteristic and the design data, and outputting the criticality factor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.