Electron beam plasma source with segmented beam dump for uniform plasma generation
US8951384B2 · kind B2 · utility
1Cited by
16References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 2012 |
| Grant date | Feb 10, 2015 |
| Priority date | — |
| Expiry date | Apr 26, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H7/001
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented beam dump that is profiled to promote uniformity in the electron beam-produced plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.