Patent · US Active

Polishing pad with alignment feature

US8968058B2 · kind B2 · utility

18Cited by
11References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 5, 2011
Grant dateMar 3, 2015
Priority date
Expiry dateNov 27, 2032

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08J2201/022
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Polishing pads with alignment marks are described. Methods of fabricating polishing pads with alignment marks are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.