William C. Allison
36Patents
11h-index
26Co-inventors
75Inventor score
Filing activity: Nov 6, 1990 → Apr 5, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9156124B2 | Soft polishing pad for polishing a semiconductor substrate | Performing Operations; Transporting | 35 | Active |
| US9017140B2 | CMP pad with local area transparency | Performing Operations; Transporting | 35 | Active |
| US9296085B2 | Polishing pad with homogeneous body having discrete protrusions thereon | Performing Operations; Transporting | 30 | Active |
| US8702479B2 | Polishing pad with multi-modal distribution of pore diameters | Performing Operations; Transporting | 29 | Active |
| US9067297B2 | Polishing pad with foundation layer and polishing surface layer | Performing Operations; Transporting | 29 | Active |
| US9211628B2 | Polishing pad with concentric or approximately concentric polygon groove pattern | Performing Operations; Transporting | 20 | Active |
| US9067298B2 | Polishing pad with grooved foundation layer and polishing surface layer | Performing Operations; Transporting | 18 | Active |
| US8968058B2 | Polishing pad with alignment feature | Chemistry; Metallurgy | 18 | Active |
| US5880196A | Inkjet printing media | Performing Operations; Transporting | 16 | Expired |
| US7291063B2 | Polyurethane urea polishing pad | Emerging Cross-Sectional Technologies | 15 | Active |
| US6905402B2 | Polishing pad for planarization | Performing Operations; Transporting | 14 | Expired |
| US6340725B1 | Inkjet printing media | Emerging Cross-Sectional Technologies | 11 | Expired |
| US5948396A | Hair fixative amphoteric polymer composition | Emerging Cross-Sectional Technologies | 11 | Expired |
| US9649742B2 | Polishing pad having polishing surface with continuous protrusions | Performing Operations; Transporting | 9 | Active |
| US8920219B2 | Polishing pad with alignment aperture | Performing Operations; Transporting | 8 | Active |
| US5075042A | Surfactant blend containing an alkyl poly(ethyleneoxy)sulfonate to reduce dermal irritation | Chemistry; Metallurgy | 5 | Expired |
| US7097549B2 | Polishing pad | Chemistry; Metallurgy | 5 | Expired |
| US6074761A | Inkjet printing media | Emerging Cross-Sectional Technologies | 4 | Expired |
| US8439994B2 | Method of fabricating a polishing pad with an end-point detection region for eddy current end-point detection | Performing Operations; Transporting | 3 | Active |
| US6228822A | Synthetic detergent base material and synthetic detergent bar produced therefrom | Chemistry; Metallurgy | 3 | Expired |
| US10160092B2 | Polishing pad having polishing surface with continuous protrusions having tapered sidewalls | Performing Operations; Transporting | 3 | Active |
| US8628384B2 | Polishing pad for eddy current end-point detection | Performing Operations; Transporting | 2 | Active |
| US9597769B2 | Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer | Performing Operations; Transporting | 2 | Active |
| US9238294B2 | Polishing pad having porogens with liquid filler | Performing Operations; Transporting | 1 | Active |
| US9868185B2 | Polishing pad with foundation layer and window attached thereto | Performing Operations; Transporting | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.