Defect inspecting apparatus and defect inspecting method
US8970836B2 · kind B2 · utility
1Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 14, 2012 |
| Grant date | Mar 3, 2015 |
| Priority date | — |
| Expiry date | May 14, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136259
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.