Extended and independent RF powered cathode substrate for extreme edge tunability
US8988848B2 · kind B2 · utility
41Cited by
2References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 12, 2012 |
| Grant date | Mar 24, 2015 |
| Priority date | — |
| Expiry date | Jun 1, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/23
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a substrate support comprising a first electrode disposed within the substrate support and having a peripheral edge and a first surface; a substrate support surface disposed above the first surface of the first electrode; and a second electrode disposed within the substrate support and extending radially beyond the peripheral edge of the first electrode, wherein the second electrode has a second surface disposed about and above the first surface of the first electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.