Inventor · San Jose, CA, US

Samer Banna

50Patents
6h-index
52Co-inventors
71Inventor score

Filing activity: Jul 30, 2008 → Feb 1, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US8937800B2 Electrostatic chuck with advanced RF and temperature uniformity Electricity 289 Active
US8368308B2 Inductively coupled plasma reactor having RF phase control and methods of use thereof Electricity 270 Active
US8988848B2 Extended and independent RF powered cathode substrate for extreme edge tunability Emerging Cross-Sectional Technologies 41 Active
US8933628B2 Inductively coupled plasma source with phase control Electricity 35 Active
US8974684B2 Synchronous embedded radio frequency pulsing for plasma etching Electricity 12 Active
US10163606B2 Plasma reactor with highly symmetrical four-fold gas injection Electricity 10 Active
US10705514B2 Adaptive chamber matching in advanced semiconductor process control Emerging Cross-Sectional Technologies 6 Active
US8578879B2 Apparatus for VHF impedance match tuning Electricity 5 Active
US10008368B2 Multi-zone gas injection assembly with azimuthal and radial distribution control Electricity 5 Active
US9536710B2 Tunable gas delivery assembly with internal diffuser and angular injection Electricity 4 Active
US9779953B2 Electromagnetic dipole for plasma density tuning in a substrate processing chamber Electricity 4 Active
US10929586B2 Predictive spatial digital design of experiment for advanced semiconductor process optimization and control Physics 4 Active
US8299391B2 Field enhanced inductively coupled plasma (Fe-ICP) reactor Electricity 3 Active
US10332772B2 Multi-zone heated ESC with independent edge zones Emerging Cross-Sectional Technologies 3 Active
US9646893B2 Method and apparatus for reducing radiation induced change in semiconductor structures Electricity 3 Active
US8360003B2 Plasma reactor with uniform process rate distribution by improved RF ground return path Electricity 3 Active
US9257265B2 Methods for reducing etch nonuniformity in the presence of a weak magnetic field in an inductively coupled plasma reactor Electricity 2 Active
US8956886B2 Embedded test structure for trimming process control Electricity 2 Active
US10657214B2 Predictive spatial digital design of experiment for advanced semiconductor process optimization and control Physics 2 Active
US10955832B2 Adaptive chamber matching in advanced semiconductor process control Emerging Cross-Sectional Technologies 2 Active
US11244811B2 Plasma reactor with highly symmetrical four-fold gas injection Electricity 1 Active
US10573493B2 Inductively coupled plasma apparatus Electricity 1 Active
US8492980B2 Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system Electricity 1 Active
US9472378B2 Multiple zone coil antenna with plural radial lobes Electricity 1 Active
US11139150B2 Nozzle for multi-zone gas injection assembly Electricity 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.