Imad Yousif
29Patents
8h-index
51Co-inventors
78Inventor score
Filing activity: Jun 28, 1996 → Jun 17, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8988848B2 | Extended and independent RF powered cathode substrate for extreme edge tunability | Emerging Cross-Sectional Technologies | 41 | Active |
| US6366346B1 | Method and apparatus for optical detection of effluent composition | Electricity | 39 | Expired |
| US8092605B2 | Magnetic confinement of a plasma | Electricity | 35 | Active |
| US7967996B2 | Process for wafer backside polymer removal and wafer front side photoresist removal | Electricity | 10 | Active |
| USD699692S1 | Upper liner | General | 10 | Active |
| US10163606B2 | Plasma reactor with highly symmetrical four-fold gas injection | Electricity | 10 | Active |
| US10090181B2 | Method and apparatus for substrate transfer and radical confinement | Electricity | 9 | Active |
| US10204805B2 | Thin heated substrate support | Electricity | 9 | Active |
| US8329593B2 | Method and apparatus for removing polymer from the wafer backside and edge | Electricity | 7 | Active |
| US7552736B2 | Process for wafer backside polymer removal with a ring of plasma under the wafer | Electricity | 6 | Active |
| US6123097A | Apparatus and methods for controlling process chamber pressure | Emerging Cross-Sectional Technologies | 5 | Expired |
| US11393710B2 | Wafer edge ring lifting solution | Electricity | 5 | Active |
| US7879183B2 | Apparatus and method for front side protection during backside cleaning | Performing Operations; Transporting | 5 | Active |
| US10008368B2 | Multi-zone gas injection assembly with azimuthal and radial distribution control | Electricity | 5 | Active |
| US8414736B2 | Plasma reactor with tiltable overhead RF inductive source | Electricity | 3 | Active |
| US9947559B2 | Thermal management of edge ring in semiconductor processing | Chemistry; Metallurgy | 2 | Active |
| US11244811B2 | Plasma reactor with highly symmetrical four-fold gas injection | Electricity | 1 | Active |
| US11139150B2 | Nozzle for multi-zone gas injection assembly | Electricity | 1 | Active |
| US10825708B2 | Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability | Emerging Cross-Sectional Technologies | 1 | Active |
| US9464732B2 | Apparatus for uniform pumping within a substrate process chamber | Emerging Cross-Sectional Technologies | 1 | Active |
| US11728141B2 | Gas hub for plasma reactor | Electricity | 1 | Active |
| US12094752B2 | Wafer edge ring lifting solution | Electricity | 1 | Active |
| US10410841B2 | Side gas injection kit for multi-zone gas injection assembly | Electricity | 0 | Active |
| US9330887B2 | Plasma reactor with tiltable overhead RF inductive source | Electricity | 0 | Active |
| US11177136B2 | Abatement and strip process chamber in a dual loadlock configuration | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.