Defect inspection device and defect inspection method
US9019492B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 10, 2011 |
| Grant date | Apr 28, 2015 |
| Priority date | — |
| Expiry date | May 7, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8477
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
To prevent overlooking of a defect due to reduction in a defect signal, a defect inspection device is configured such that: light is irradiated onto an object to be inspected on which a pattern is formed; reflected, diffracted, and scattered light generated from the object by the irradiation of the light is collected, such that a first optical image resulting from the light passed through a first spatial filter having a first shading pattern is received by a first detector, whereby a first image is obtained; the reflected, diffracted, and scattered light generated from the object is collected, such that a second optical image resulting from the light passed through a second spatial filter having a second shading pattern is received by a second detector, whereby a second image is obtained; and the first and second images thus obtained are processed integrally to detect a defect candidate(s).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.