Methods and apparatus for combinatorial PECVD or PEALD
US9023438B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Dec 17, 2012 |
| Grant date | May 5, 2015 |
| Priority date | — |
| Expiry date | Jun 20, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus and methods for depositing materials on a plurality of site-isolated regions on a substrate are provided. The deposition uses PECVD or PEALD. The apparatus include an inner chamber with an aperture and barrier that can be used to isolate the regions during the deposition and prevent the remaining portions of the substrate from being exposed to the deposition process. The process parameters for the deposition process are varied among the site-isolate regions in a combinatorial manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.