Patent · US Active

Method for processing a carrier, a carrier, an electronic device and a lithographic mask

US9029049B2 · kind B2 · utility

0Cited by

0References

17Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Jens Schneider · Bielefeld, DE
Henning Feick · Dresden, DE
Marcel Heller · Neustadt in Sachsen, DE
Dieter Kaiser · Dortmund, DE

Key dates

Filing date	Feb 20, 2013
Grant date	May 12, 2015
Priority date	—
Expiry date	May 24, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24802
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Various embodiments provide a method for processing a carrier, the method including changing the three-dimensional structure of a mask layer arranged over the carrier so that at least two mask layer regions are formed having different mask layer thicknesses; and applying an ion implantation process to the at least two mask layer regions to form at least two implanted regions in the carrier having different implantation depth profiles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.