Off-center ground return for RF-powered showerhead
US9039864B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2010 |
| Grant date | May 26, 2015 |
| Priority date | — |
| Expiry date | Apr 3, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49117
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrical ground (36) of an RF impedance matching network (33) is connected to a connection area (50) on the grounded chamber cover (18) of a plasma chamber. The connection area is offset away from the center of the chamber cover toward a workpiece passageway (20). Alternatively, an RF power supply (30) has an electrically grounded output (32) that is connected to a connection area (52) on the chamber cover having such offset. Alternatively, an RF transmission line (37) has an electrically grounded conductor (39) that is connected between a grounded output of an RF power supply and a connection area (52) on the chamber cover having such offset.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.