Patent · US Active

Microlithographic projection exposure apparatus

US9052606B2 · kind B2 · utility

0Cited by

3References

19Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Andras G. Major · Oberkochen, DE
Manfred Maul · Aalen, DE
Gundula Weiss · Aalen, DE
Jochen Hetzler · Aalen, DE

Key dates

Filing date	Sep 26, 2012
Grant date	Jun 9, 2015
Priority date	—
Expiry date	Jul 27, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithographic projection exposure apparatus includes a projection light source. The apparatus also includes a heating light source for generating heating light which is at least partly absorbed by an optical element. An illumination optical unit directs the heating light onto the optical element such that the heating light has a predefined intensity distribution on an optical surface of the optical element. The illumination optical unit includes a deflection element which is a diffractive optical element or a refractive freeform element. The deflection element simultaneously directs the heating light impinging thereon in different directions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.