Wafer edge inspection illumination system
US9062859B2 · kind B2 · utility
1Cited by
16References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2013 |
| Grant date | Jun 23, 2015 |
| Priority date | — |
| Expiry date | Jun 23, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9503
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Wafer edge inspection approaches are disclosed wherein an imaging device captures at least one image of an edge of a wafer. The at least one image can be analyzed in order to identify an edge bead removal line. An illumination system having a diffuser can further be used in capturing images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.