Patent · US Active

Lithographic tool in situ clean formulations

US9074169B2 · kind B2 · utility

10Cited by
13References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 26, 2010
Grant dateJul 7, 2015
Priority date—
Expiry dateMar 30, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/22
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Compositions and methods of using said composition for removing polymeric materials from surfaces, preferably cleaning contaminant buildup from a lithography apparatus without total disassembly of said apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.