Uniformity tuning capable ESC grounding kit for RF PVD chamber
US9087679B2 · kind B2 · utility
3Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 3, 2012 |
| Grant date | Jul 21, 2015 |
| Priority date | — |
| Expiry date | Aug 5, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3441
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of the invention generally relate to a grounding kit for a semiconductor processing chamber, and a semiconductor processing chamber having a grounding kit. More specifically, embodiments described herein relate to a grounding kit which creates an asymmetric grounding path selected to significantly reduce the asymmetries caused by an off center RF power delivery.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.