Multipurpose combinatorial vapor phase deposition chamber

US9087864B2 · kind B2 · utility

Assignee

• INTERMOLECULAR, INC. · US

Inventors

• Chen-An Chen · Sunnyvale, US
• Tony P. Chiang · Campbell, US
• Frank Greer · Pasadena, US
• Martin Romero · San Jose, US
• James Tsung · Milpitas, US

Key dates

• Filing date: Dec 19, 2013
• Grant date: Jul 21, 2015
• Expiry date: Dec 19, 2033

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67207
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In some embodiments, apparatus are provided that provide for flexible processing in high productivity combinatorial (HPC) system. The apparatus allow for interchangeable functionality that includes deposition, plasma treatment, ion beam treatment, in-situ annealing, and in-situ metrology. The apparatus are designed so that the functionality may be integrated within a single processing chamber for enhanced flexibility.