Gas supply systems for substrate processing chambers and methods therefor
US9090972B2 · kind B2 · utility
4Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2012 |
| Grant date | Jul 28, 2015 |
| Priority date | — |
| Expiry date | Sep 9, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/7722
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A gas supply subsystem for providing a set of process gases to a substrate processing chamber, the set of process gases being a subset of a plurality of process gases available to the substrate processing chamber. The gas supply subsystem has fewer multi-gas mass flow controllers than the number of available process gases, wherein multiple process gases are multiplexed at the input of one or more of the multi-gas mass flow controllers. Pump-purge may be employed to improve gas switching speed for the multi-gas mass flow controllers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.