Electron beam plasma source with arrayed plasma sources for uniform plasma generation
US9129777B2 · kind B2 · utility
1Cited by
17References
16Claims
0Family size
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Key dates
| Filing date | Aug 27, 2012 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | Dec 16, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32082
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor that generates plasma in workpiece processing chamber by a electron beam, has an electron beam source chamber and an array of plasma sources facing the electron beam source chamber for affecting plasma electron density in different portions of the processing chamber. In another embodiment, an array of separately controlled electron beam source chambers is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.