Patent · US Active

Method of particle contaminant removal

US9159593B2 · kind B2 · utility

3Cited by

17References

18Claims

0Family size

Assignee

Lam Research Corporation · US

Inventors

Mark Kawaguchi · Palo Alto, US
David Mui · Fremont, US
Mark Wilcoxson · Oakland, US

Key dates

Filing date	Jun 16, 2009
Grant date	Oct 13, 2015
Priority date	—
Expiry date	Aug 12, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D2111/42
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Apparatus and methods for removing particle contaminants from a solid surface includes providing a layer of a viscoelastic material on the solid surface. The viscoelastic material is applied as a thin film and exhibits substantial liquid-like characteristics. The viscoelastic material at least partially binds with the particle contaminants. A high velocity liquid is applied to the viscoelastic material, such that the viscoelastic material exhibits solid-like behavior. The viscoelastic material is thus dislodged from the solid surface along with the particle contaminants, thereby cleaning the solid surface of the particle contaminants.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.