David Mui
68Patents
17h-index
86Co-inventors
87Inventor score
Filing activity: Nov 12, 1997 → Mar 26, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6699399B1 | Self-cleaning etch process | Emerging Cross-Sectional Technologies | 458 | Expired |
| US6924191B2 | Method for fabricating a gate structure of a field effect transistor | Electricity | 409 | Expired |
| US6235643A | Method for etching a trench having rounded top and bottom corners in a silicon substrate | Electricity | 270 | Expired |
| US6677242B1 | Integrated shallow trench isolation approach | Electricity | 236 | Expired |
| US6136211A | Self-cleaning etch process | Emerging Cross-Sectional Technologies | 94 | Expired |
| US7779232B2 | Method and apparatus for dynamically managing instruction buffer depths for non-predicted branches | Physics | 62 | Active |
| US6317811A | Method and system for reissuing load requests in a multi-stream prefetch design | Physics | 58 | Expired |
| US6960416B2 | Method and apparatus for controlling etch processes during fabrication of semiconductor devices | Electricity | 46 | Expired |
| US9069563B2 | Reducing store-hit-loads in an out-of-order processor | Physics | 32 | Active |
| US6180533A | Method for etching a trench having rounded top corners in a silicon substrate | Electricity | 31 | Expired |
| US6037265A | Etchant gas and a method for etching transistor gates | Electricity | 29 | Expired |
| US6449698B1 | Method and system for bypass prefetch data path | Physics | 27 | Expired |
| US6484220B1 | Transfer of data between processors in a multi-processor system | Physics | 22 | Expired |
| US7094613B2 | Method for controlling accuracy and repeatability of an etch process | Electricity | 21 | Expired |
| US6911399B2 | Method of controlling critical dimension microloading of photoresist trimming process by selective sidewall polymer deposition | Electricity | 20 | Expired |
| US8617993B2 | Method of reducing pattern collapse in high aspect ratio nanostructures | Electricity | 20 | Active |
| US6858361B2 | Methodology for repeatable post etch CD in a production tool | Electricity | 19 | Expired |
| US8943299B2 | Operating a stack of information in an information handling system | Physics | 17 | Active |
| US6458671B1 | Method of providing a shallow trench in a deep-trench device | Electricity | 14 | Expired |
| US6134684A | Method and system for error detection in test units utilizing pseudo-random data | Physics | 14 | Expired |
| US6566270B1 | Integration of silicon etch and chamber cleaning processes | Electricity | 12 | Expired |
| US6924088B2 | Method and system for realtime CD microloading control | Emerging Cross-Sectional Technologies | 11 | Expired |
| US7498106B2 | Method and apparatus for controlling etch processes during fabrication of semiconductor devices | Electricity | 10 | Active |
| US6632321B2 | Method and apparatus for monitoring and controlling wafer fabrication process | Electricity | 9 | Expired |
| US8227394B2 | Composition of a cleaning material for particle removal | Chemistry; Metallurgy | 9 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.