Coating and development treatment system with airflow control including control unit and movable airflow control plate
US9162247B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2012 |
| Grant date | Oct 20, 2015 |
| Priority date | — |
| Expiry date | Apr 17, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02A90/10
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coating treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate; a rotation part rotating the substrate held on the substrate holding part; a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part; and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.