Molybdenum allyl complexes and use thereof in thin film deposition
US9175023B2 · kind B2 · utility
17Cited by
12References
7Claims
0Family size
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Key dates
| Filing date | Jan 18, 2013 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Jan 18, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45553
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R1, R3, R5, R7, R8 and R10 are independently and at each occurrence alkyl; R2, R6 and R9 are independently alkyl; R4 and R11 are independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.