System and method for apodization in a semiconductor device inspection system
US9176069B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2013 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Feb 6, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8825
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An inspection system with selectable apodization includes an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light emanating from the surface of the sample, the illumination source and the detector being optically coupled via an optical pathway of an optical system, a selectably configurable apodization device disposed along the optical pathway, wherein the apodization device includes one or more apodization elements operatively coupled to one or more actuation stages configured to selectably actuate the one or more apodization elements along one or more directions, and a control system communicatively coupled to the one or more actuation and configured to selectably control apodization of illumination transmitted along the optical pathway by controlling an actuation state of the one or more apodization elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.