Polishing pad with concentric or approximately concentric polygon groove pattern
US9211628B2 · kind B2 · utility
20Cited by
12References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 26, 2011 |
| Grant date | Dec 15, 2015 |
| Priority date | — |
| Expiry date | May 23, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24D11/001
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Polishing pads with concentric or approximately concentric polygon groove patterns are described. Methods of fabricating polishing pads with concentric or approximately concentric polygon groove patterns are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.