Dynamic support system for quartz process chamber
US9240513B2 · kind B2 · utility
0Cited by
22References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2011 |
| Grant date | Jan 19, 2016 |
| Priority date | — |
| Expiry date | Mar 10, 2034 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16M11/18
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.