Patent · US Active

Polishing pad with alignment feature

US9249273B2 · kind B2 · utility

0Cited by
11References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 30, 2015
Grant dateFeb 2, 2016
Priority date
Expiry dateJan 30, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08J2201/022
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Polishing pads with alignment marks are described. Methods of fabricating polishing pads with alignment marks are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.