Patent · US Active

Microwave waveguide apparatus, plasma processing apparatus and plasma processing method

US9252000B2 · kind B2 · utility

1Cited by
6References
20Claims
0Family size

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Key dates

Filing dateJan 21, 2014
Grant dateFeb 2, 2016
Priority date
Expiry dateJan 21, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32211
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A microwave waveguide apparatus for generating plasma includes a waveguide which has first and second ends and propagates microwave from input end such that the microwave propagates from the first end to the second end, a circulator device having a first port, a second port coupled to the first end, and a third port coupled to the second end, the circulator device being structured such that the microwave is received at the first port, propagates from the second port to the first end, is received at the third port from the second end and is returned toward the input end, and a matching device which is interposed between the input end and the circulator device and reflects part of the microwave received at the third port and returned toward the input end to the first port. The waveguide has a slot-hole extending along the microwave propagation direction in the waveguide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.